In situ GISAXS and XRF during Atomic Layer Deposition

09-03-2015

Real time characterisation of the evolution of the deposited film and its nanoscale morphology

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The COCOON research group of Ghent University has developed a dedicated vacuum setup for in situ GISAXS and XRF measurements during Atomic Layer Deposition (ALD).

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In the picture you can see the entrance Be window as well as the exit Be window for the fluorescent x-rays. The scattered X-rays are led to the Pilatus 1M detector via the evacuated flight tube. The setup is equipped with a plasma source and gas inlets with computer-controlled pneumatic valves. Using a home-built controller and Labview software, precursor vapors and gasses can sequentially be pulsed into the reactor, resulting in  the growth of metal nanoparticles and thin films.

The evolution of the nanoscale morphology and quantity of metal atoms deposited was characterised using In situ GISAXS and XRF as illustrated by the data below. 

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The growth of the thin film is shown clearly by the increasing extent of the scattering along qz . Distances between maxima along the qz direction are inversely related to the layer thickness.

Top image: GISAXS images illustrating growth of thin film