Especially in high pressure and surface/interface applications a vertical and/or horizontal focus is an issue. The three endstations at different distances from the source and the various Mossbauer transition energies between 6 and 40 keV make a general design difficult and need a compromise.

For general applications we provide a focal spot of about 100 um x 100 um. The vertical focusing is achieved by several compound refractive lenses in the front end of the beamline. Whereas, for the horizontal focusing we adapted the design of a bent Si crystal from the Optics group which is permanently installed in OH2 and gives a throughput of 80%.

Bent-xtal

Bent Si crystal

For more demanding focusing, i.e. down to about 10 um x 10um, multilayers in Kirkpatrick-Baez geometry with a focal distance of about 700 mm are utilized. Also in this case the entire beam can be accepted and the throughput is 40% at 14.4 keV. This system needs each time to be installed just up-stream to the corresponding sample environment.

Kirkpatrick-Baez multilayer mirror

Additional information: