X-ray Optics for Nanofocusing Meeting

Tuesday 10 February 2009

ESRF, Grenoble, France

Objectives of the Event

The primary aim of this workshop will to be explore the opportunities for cooperative developments in the field of X-ray Optics for Nanofocusing.

During the meeting we will seek to highlight  the current state-of-the-art and capabilities for X-ray optics development and characterisation at the various light sources. Topics which will be discussed include:

• Latest developments in diffractive, reflective and refractive X-ray focusing optics
• Pathways towards the ultimate focusing of soft and hard X-rays
• Current capacity for optical device production and projected future requirements
• Application of nanofocusing optics for routine measurements at X-ray beamlines
• Available processing and test infrastructures

A key objective of the workshop will be to produce a draft roadmap for X-ray nanofocusing optics development outlining the various issues which will need to be addressed in order to satisfy the future needs of the light sources. The priorities and potential bottlenecks identified in this report will allow us to develop an appropriate strategy for possible collaborative developments between the participants. For this we will also draw upon the experience of the IA-SFS JRA3 (Microfocusing Devices) which has been exploring new technologies for producing diffractive focusing elements. Our hope is that we could build upon this type of model whilst incorporating , in addition, development activities encompassing reflective and refractive elements.

Programme

Participants