The 9th International Conference on the Physics of X-Ray Multilayer Structures
| What | Conference |
|---|---|
| When |
03-02-2008 to 07-02-2008 |
| Where | Montana, USA |
| Scientific Contact(s) | |
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last modified
09-03-2009 18:00
Multilayer thin film structures optimized for their X-ray optical properties have enabled the construction of a variety of new optical elements and instruments operating in the EUV, soft X-ray and hard X-ray spectral regions. This technology is by now used for a wide range of scientific and industrial applications, including photolithography, astronomy and solar physics, plasma physics, synchrotron radiation, X-ray and free-electron lasers, ultrashort-pulse physics, X-ray crystallography, and others. Continued advancement in these areas depends on further improvements in multilayer technology, which in turn requires a deeper understanding of the X-ray optical physics and material science of these nanometer-scale heterostructures.
Principal Themes
- Film Growth
- Microstructure Development
- Roughness Evolution
- Interface Formation
- Surface and Thin-Film Modifications using Ion Beams
- Film Removal Techniques
- Growth Models and Computer Simulations
- X-ray and Neutron Scattering
- Surface and Interface Topology
- Layer and Interface Composition
- Wavefront Characterization
- Mechanical Properties
- Stability
- Optical Properties
- Novel Characterization Techniques
- Multilayer X-Ray Optics
- Wavefront Correction
- Bandpass Optimization
- Polarization Control