XSW Chamber (EH2)

General Description

The XSW chamber is basically used for X-rays Standing Waves studies combined with XPS measurements. It has a PHI hemispherical electron analyzer for energies up to 4800 eV with a resolution of ΔE/E = ???. UHV conditions are guaranteed by turbo and ion pumps.

It is equipped with:

• A PHI hemispherical electron analyser of 150 mm radius and a 16 channels detector system
• An XYZ sample manipulator, standard VG-Omniax, with two rotations. All motions are stepper motor driven
• A VGXL25 sample-holder with possibilities of heating the sample up to 800°C and cool it down to 30K with a copper braid connected to a cryostat
• An Omicron rear view LEED-Optics
• A Perkin Elmer sputtering gun for sample preparation
• A load-lock chamber with a transfer rod to introduce samples into the main chamber under UHV conditions
• A three way gas line for different gases
• A residual gas analyser, RGA
• Several evaporation sources (electron bombardment or Knudsen cells) for thin film preparation
• A port for solid state X-rays fluorescence detector
• Some spare ports for user defined equipments

Standing waves principles

• Backscattering conditions
• Simultaneous measurement of reflectivity signal on the sample and XPS/XFS yield

Highlights experiments

• XPS measurements up to 3200eV or 4800eV Kinetic Energy
• XSW with combined XPS and reflectivity measurements
• XFS and XSW with optional Fluorescence detectors