Optic Hutch Content:

• primary slits
• monochromator (horizontally side diffracting Silicon 111 crystal). Fixed wavelength (0.873Å).

picture 1: silicon crystal + cooling system before installtion in the vacuum vessel (21st of oct. 2005).

• secondary slits

Experimental Hutch Content:

The experimental setup (diffractometer, experimental table, slit box, etc...) is very similar to the other experimental ESRF MX setups.

• Focusing mirrors: one pair of (300x40x15) mm3 long Pt coated Si mirror, 260mm usable, in a Kirkpatrick-Baez geometry;
  • Distance vertical focussing (VF) mirror-sample: 2.2m;
  • Distance horizontal focussing (HF) mirror-sample: 1.8m
  • Incidence angle: 3.9 mrad Orthogonality: ~1 µm
  • Real slope error: 0.69 mrad (VF) and 0.36 mrad (HF)
  •  Re: 1072 m (VF) and 884.3 m (HF)

• Attenuators : 12 filters (Al + C)

• Goniometer type: modified MD2M (currently called "minidiff"); similar to other ESRF MX beamline MD2M except a supplementary set of 2 translation tables (similar to the beamstop group) to support a beam cleaning aperture and a scintillator.

• Detector type : CCD detector (MarMosaic 225; 3072x3072 pixels; pixel size: 73.25 µm).

• Cooling system: Oxford cryo700 ; temperature range: from 85 to 400 K.

Some distances:

• Source-monochromator: 30 m
• Source-secondary slits: 40.9 m
• Source KB: 43.15
• Source-sample: 45.15m