Beamline Layout

General lay-out

Click on image map to zoom into the separated hutches

The ID16 station comprises four experimental hutches and three control cabins. The first hutch (OH1) contains the primary slits, an attenuator filter unit, and the white-beam photon shutter and absorber (SS1). The undulator beam is then transferred through the Experimental hutch (EH1) in a lead enclosed vacuum tube (white-beam transfer line, WBTL) into OH2, where the high-heat load silicon (1,1,1) monochromator is located.

The premonochromatised x-ray beam is then transferred via the monochromatic-beam transfer line to the monochromatic hutch MH1 where the very high energy resolution backscattering monochromator and the focusing mirror are located. At the end of OH2 a premonochromatic safety shutter (SS2) is located that allows us to enter in the MH1 without perturbing the thermal stabilization of the high-heat load premonochromator.

The x-ray beam, after backscattering from the monochromator is impinging on the mirror and deflected upwards. It travels back through the monochromatic-beam transfer line and OH2 into the Experimental hutch EH1, where the IXS spectrometers are located. A monochromatic beam shutter (SS3) is installed in the backscattered beam path in OH2. This allows to keep all the optics under heat load, while still having access to the experimental hutch. Control cabin CC1 contains all the motor and electronics control and is the place from which the instrument is operated. CC2 provides preparation space for mounting and testing various sample environments, and CC3 hosts an additional PC for the data analysis.  

General optical lay-out 

The optical lay-out is based on the triple-axis principle, composed of the very high energy resolution monochromator (first axis), the sample goniometry (second axis) and the crystal analyser (third axis). The figure below shows a schematic view of the optics and the distances involved. Due to the backscattering geometry the beamline is fairly long in order to acquire a sufficient beam offset between the incident photon beam from the X-ray source and the focused very high-energy resolution beam at the sample position.

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