Scientific applications

Study of interfaces and surfaces at air or under ultra high vacuum by X-ray scattering techniques

Source characteristics

Bending magnet - see  Characteristics of bending magnet source BM32 at ESRF

source size

less than 0.3x0.1 mm2 (HxV) FWHM
vert. source divergence 0.13 mrad at 20 keV
total horiz.ang.acceptance 2.8 mrad

 

Optical Hutch

 From right to left (X-ray beam travel direction):                                                                                              attenuator and slits (HxV)

                                                                                                                                                     mirror 1

                                                                                                                  monochromator

                                                                                     mirror 2

       micrometric slits (pink beam mode)

Ensemblebm32

Optics (monochromatic mode)

optical elements mirror 1 double-crystal
mono.
mirror 2
distance from source 26 m 28 m 30 m
focusing type vert.collim.or foc.
Ir-coating
horiz.(sagital)foc.
Si(111)
vert. foc.
Ir-coating
working angle 0-7 mrad 0-25 deg. 0-10 mrad
beam size at sample position (1:1) : 0.5x0.3 mm2 (HxV)
spectral range 7-30 keV
energy resolution in E/E  0.5x10-4 for Si(311)
 2x10-4 for Si(111)
flux at sample  5x1011 ph s-1(10-4 rbw, 0.1 A at 20 keV)

 

Optics (pink beam mode)

 

optical elements mirror 1 mirror 2 secondary
source
two Kirkpatrick-Baez (Pt) mirrors
distance from source 26 m 30 m 35 m 60 m
Optical function vert. foc.
Ir-coating
vert. foc.
Ir-coating
20X20 µm2 vert.+horiz. foc.
working angle 3.65mrad 3.65 mrad   2.9 mrad
beam size at sample 0.5x0.7 µm2 (HxV) FWHM
pink beam spectral range 5-25 keV
estimated flux at sample approx. 10^11 photons/sec in standard monochromatic conditions

 

Three instruments:

INS: In Situ Nanostructures and Surfaces (UHV)

GMT: Multipurpose goniometer

MicroDiff: Laue Microdiffraction setup